◆non-contact eddy-current probes
◆Non-Damage measurement by non-contact measurement
◆Fast testing speed
◆Good repeatability
◆High test sensitivity
◆ Semiconductor material
◆ Graphene
◆ Transparent conductive film
◆ Carbon Nanotubes
◆ Metal
| Parameters | Probe | Resistance Range | Resistance Range | Testing Method |
|---|---|---|---|---|
| Range | Low-resistance probe | 0.005-1 Ω/sq | 0.25-50 mΩ·cm | Eddy current method, non- contact |
| Mid-resistance probe | 0.05-10 Ω/sq | 2.5-500 mΩ·cm | ||
| High-resistance probe | 10-3000 Ω/sq | 0.5-150 Ω·cm | ||
| Ingot probe | 0.01-2 Ω·cm | |||
| Repeatability | <0.2%(≤50% range) | <0.5%(>50% range) | ||
| Accuracy | <2%(≤50% range) | <3%(>50% range) | ||
| Probe Information | Type of Probe: Dual-probe (upper and lower probes with a 2-3mm gap), Probe Diameter: Outer diameter 20mm, Inner diameter 14mm (effective testing part), Probe Gap: 30mm | |||
| Coordinate Settings | Arbitrary Coordinate Settings | |||
| Store data | Internal Database Storage (Exportable Table Files), PDF Test Report containing test information (time, operator), wafer information (number, size, thickness), data information (number of test points, max/min/average values, relative standard deviation, etc.), contour maps, surface maps, etc. CSV Table Data Storable to Remote Server Modifiable report information as per customer requirements | |||
| WAFER Information | Size: 2”-8” (inches) | Thickness:100-1500mm | ||
| System Requirements | Power Supply: AC220V,50/60Hz Relative Humidity:20%-80%RH | Power: 600W Environment: Temperature 24℃±10℃ Size: 975*465*425(mm) Lifespan: >10 years | ||
| Material | Resistivity | Sheet Resistance |
|---|---|---|
| Silicon wafer | Y | Y |
| Sic wafer /Ingot | Y | Y |
| GaO wafer /Ingot | Y | Y |
| GaN wafer 2DEGI | Y | Y |
| GaAs 2EDG | N | Y |
| GZO/LTPS/ITO | N | Y |
| flat panel) | N | Y |
| TCO(Touch panel) | N | Y |
| Graphene | N | Y |
| Metal film | N | Y |
